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    語言選擇: 中文版 ∷  英文版

    光刻系統

    • 納米壓印系統
    納米壓印系統

    納米壓印系統

    納米壓印系統
    EZImprinting introduces a bench-top, stand-alone nanoimprint platform.
    This platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, UV-curing source, and alignment microscope.
    It functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.


    EZImprinting Advantages
    ?  Sub-10nm resolution with 99% yield
    ?  Supports both hard and soft molds
    ?  Variable mold and substrate sizes offer unparalleled convenience and flexibility
    ?  Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
    ?  Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
    ?  Versatile processes for a wide variety of applications:
    ?  optical devices, displays, data storage, biomedical
    ?  devices, semiconductor IC's, chemical synthesis, and advanced materials
    ?  Programmable PLC with touch-screen user interface allows process control through customized parameters
    ?  Proprietary UV-curable nanoimprint resist has no limitations on hardness or thickness, and is compatible with traditional photolithography processes
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    聯系我們

    CONTACT US

    聯系人:張垚

    手機:13916855175

    電話:021-56035615

    郵箱:info@crosstech.com.cn

    地址: 上海市楊浦區松花江路251弄白玉蘭環保廣場3號902室

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