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光刻系統

  • 納米壓印系統
納米壓印系統

納米壓印系統

納米壓印系統
EZImprinting introduces a bench-top, stand-alone nanoimprint platform.
This platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, UV-curing source, and alignment microscope.
It functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.


EZImprinting Advantages
?  Sub-10nm resolution with 99% yield
?  Supports both hard and soft molds
?  Variable mold and substrate sizes offer unparalleled convenience and flexibility
?  Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
?  Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
?  Versatile processes for a wide variety of applications:
?  optical devices, displays, data storage, biomedical
?  devices, semiconductor IC's, chemical synthesis, and advanced materials
?  Programmable PLC with touch-screen user interface allows process control through customized parameters
?  Proprietary UV-curable nanoimprint resist has no limitations on hardness or thickness, and is compatible with traditional photolithography processes
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